|
|||||
|
|
Infrared reflectivity of Cox(SiO2)1−x (x∼0.85, 0.55, 0.38) granular films on SiO2 glass substrates |
|
| Authors: | Néstor E Massa Juliano C Denardin Marcelo Knobel Xixiang Zhang |
| Institution: | a Laboratorio Nacional de Investigación y Servicios en Espectroscopía Optica-CEQUINOR, Universidad Nacional de La Plata, C.C. 962, 1900 La Plata, Argentina b Departamento de Física, Universidad de Santiago de Chile, Av. Ecuador 3493, Santiago, Chile c Instituto de Física, Universidade Federal de Goiás, 74001-970, Goiânia, Brazil d Instituto de Física, “Gleb Wataghin”, Universidade Estadual de Campinas, 13083-970, Campinas, SP, Brazil e Physics Department and Institute of Nanoscience and Technology, Hong Kong, University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China |
| Abstract: | We report the infrared specular reflectivity of Cox(SiO2)1−x (x∼0.85, 0.55, 0.38) films on SiO2 glass spanning from a metal-like to insulating behavior. While films for x∼0.85 show carrier metallic shielding and hopping conductivity, for x∼0.65 and lower concentrations, the nanoparticles’ number and size promote a localization edge near the highest longitudinal optical frequency. Such an edge is associated with a reflectivity minimum and a higher frequency band connoting strong electron-phonon interactions, carrier phonon assisted hopping, and polaron formation. Optical conductivity fits with current polaron models provide grounds toward a microscopic understanding of transport properties in these as-prepared granular films. |
| Keywords: | 78 30 -j 78 20 -e 71 38 -k 71 38 ht |
| 本文献已被 ScienceDirect 等数据库收录！ | |