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Growth and characterization of AlGaN/GaN heterostructure using unintentionally doped AlN/GaN superlattices as barrier layer
Authors:M.L. Zhang  X.L. Wang  H.L. Xiao  C.M. Wang  C.B. Yang  J. Tang  C. Feng  L.J. Jiang  G.X. Hu  J.X. Ran  ZH.G. Wang
Affiliation:1. Materials Science Center, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China;2. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China
Abstract:
Keywords:AlGaN/GaN heterostructure   Superlattices (SLs)   Root mean square roughness (RMS)   Sheet resistance
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