Photoluminescence observations of hydrogen incorporation and outdiffusion in ZnO thin films

ZnO thin films were deposited with the addition of H₂ to the reaction gas using the atmospheric-pressure metal organic chemical vapor deposition method. The incorporation and outdiffusion of hydrogen in ZnO films were investigated by comparing the intensity of the hydrogen-related bound-exciton peak (I₄: 3.363 eV) in the photoluminescence spectrum. The intensity of I₄ peak was found to be the strongest in the ZnO film deposited at 680 °C with H₂ present. However, for the ZnO films prepared at the same temperature 680 °C but without H₂ present and at the higher temperature of 900 °C with H₂ present, respectively, the I₄ peak was just a minor shoulder of another bound-exciton peak (I₈: 3.359 eV). The intensity of I₄ peak in the ZnO films deposited with H₂ present was found to decrease with the increasing of annealing temperature. These results suggest that it is difficult for hydrogen to incorporate into ZnO thin films grown at high temperatures even in the hydrogen-present ambient.