Equipment for soft X-Ray lithography on the VEPP-4M |
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| Authors: | A N Gentselev B G Goldenberg A D Nikolenko V F Pindyurin I V Poletaev |
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| Institution: | 1. Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia
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| Abstract: | An X-ray scanner for X-ray mask lithography is described. It is mounted onto the synchrotron radiation (SR) beamline of the VEPP-4M storage ring. The main advantage of this scanner is the possibility of varying the SR spectral range within wide limits and its fine tuning for solving specific technical tasks by changing the working energy of the VEPP-4M and using corresponding filters, which is illustrated by tables and plots of the calculated spectra. Calculated estimates of the lithographic resolution of lithographic complex, exposure times for various types of X-ray masks, and thicknesses of their masking layers providing the required level of X-ray mask contrast are given. |
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