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ICP-AES测定钽合金中的钨、铪
引用本文:杨军红,叶红川,高洪波,禄妮,翟通德. ICP-AES测定钽合金中的钨、铪[J]. 光谱实验室, 2010, 27(4): 1477-1480
作者姓名:杨军红  叶红川  高洪波  禄妮  翟通德
作者单位:西部金属材料股份有限公司,西安市科技三路56号,710065;首都师范大学,北京市西三环北路105号,100048;西北有色金属研究院材料分析中心,西安市未央路96号,710016
摘    要:建立了ICP-AES直接测定钽合金中钨、铪的分析方法。采用基体匹配与背景扣除法消除钽基体对钨、铪的光谱干扰,选择多谱线平均值法进行了光谱分析。待测元素的回收率为98.0%—102.2%,相对标准偏差小于1.50%。本法简便、快速、准确度高,已用于钽合金产品的检验。

关 键 词:电感耦合等离子体-原子发射光谱法  钽合金    

Determination of Tungsten and Hafnium in Tantalum Alloys by ICP-AES
YANG Jun-Hong,YE Hong-Chuan,GAO Hong-Bo,LU Ni,ZHAI Tong-De. Determination of Tungsten and Hafnium in Tantalum Alloys by ICP-AES[J]. Chinese Journal of Spectroscopy Laboratory, 2010, 27(4): 1477-1480
Authors:YANG Jun-Hong  YE Hong-Chuan  GAO Hong-Bo  LU Ni  ZHAI Tong-De
Affiliation:YANG Jun-Hong YE Hong-Chuan GAO Hong-Bo a LU Ni b ZHAI Tong-De(Western Metal Materials Co.,Ltd.,Xi'an 710065,P.R.China)a(Capital Normal University,Beijing 100048,P.R.China)b(The Center for Material Analysis,Northwest Institute for Nonferrous Metal Research,Xi'an 710016,P.R.China)
Abstract:Tungsten and hafnium in tantalum alloys was determined by ICP-AES.The tungsten and hafnium were analyzed by multi-elemental spectral lines average method and corrected by the matrix matching and background correction methods.The recoveries for the elements are in the range of 98.0%—102.2%,and relative standard deviations are less than 1.50%.The method is rapid,simple with high accuracy.It was applied to product analysis with satisfactory results.
Keywords:ICP-AES  Tantalum Alloys  Tungsten  Hafnium
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