首页 | 本学科首页   官方微博 | 高级检索  
     检索      

高气压预电离短脉冲XeCl准分子激光产生研究
引用本文:任韧,陈长乐,徐进,朱世华,金克新,任大男,王永仓,袁孝,宋宙模.高气压预电离短脉冲XeCl准分子激光产生研究[J].光谱学与光谱分析,2005,25(5):644-647.
作者姓名:任韧  陈长乐  徐进  朱世华  金克新  任大男  王永仓  袁孝  宋宙模
作者单位:1. 西安交通大学物理系和信息系, 陕西 西安 710049
2. 西北工业大学应用物理系, 陕西 西安 710072
3. 西安交通大学生物医学工程所, 陕西 西安 710049
4. 西北大学数学系, 陕西 西安 710069
基金项目:国家自然科学基金(60171034),陕西省自然科学基金(2001C21),西安交通大学自然基金(xjj2004013),博士点基金(20020698024,20030698027)资助
摘    要:研究了在高气压、大体积、泵浦功率1.395 9 MW·cm-3抽运下,产生的XeCl*准分子激光光谱,波段307.7~308.5 nm,结果显示有两个谱线峰值307.98和308.19 nm,谱线最强的跃迁是B—X跃迁,脉冲宽度11.13 ns。在气体配比HCl∶Xe∶He=0.1%∶1%∶98.9%下,采用预电离初始电子,产生稳定辉光放电过程,获得了0.5~5 Hz,单脉冲能量450 mJ,束散角3 mrad, 短脉冲的准分子激光。

关 键 词:XeCl*准分子激光  紫外预电离  纳秒放电  脉冲激光沉积技术  辉光放电  
文章编号:1000-0593(2005)05-0644-04
收稿时间:2003-12-12
修稿时间:2003年12月12

Study of New XeCl Laser with Short Duration Time and Preionzation at High Pressure
REN Ren,CHEN Chang-le,XU Jin,ZHU Shi-hua,JING Ke-xin,REN Da-nan,WANG Yong-cang,YUAN Xiao,SONG Zhou-mo.Study of New XeCl Laser with Short Duration Time and Preionzation at High Pressure[J].Spectroscopy and Spectral Analysis,2005,25(5):644-647.
Authors:REN Ren  CHEN Chang-le  XU Jin  ZHU Shi-hua  JING Ke-xin  REN Da-nan  WANG Yong-cang  YUAN Xiao  SONG Zhou-mo
Institution:1. Department of Physics and Department of Information and communiation, Xi′an Jiaotong University, Xi′an 710049, China2. Applied Physics Department, Northwestern Polytechnical University, Xi′an 710072, China3. Institute of Biomedical Engineering, Xi′an Jiaotong University, Xi′an 710049, China4. Department of Mathematics, Northwest University, Xi′an 710069, China
Abstract:New short duration time XeCI excimer laser has been generated at high pressure within a large volume in order to apply it to he interaction between laser and material, and material plasma study. The laser spectrum exhibits two laser lines at 307.98 and 308.19 nm, which is realized in the proportion of HCl:Xe: He = 0.1% :1% : 98.9% through UV preionization. Theoretic analysis indicated that the maximum intensity loop is B to X grade. Not only UV preionization, glow discharge and the calculation of dynamic equation, but also the laser spectrum and pulse duration time measurement were carried out. It is shown that the duration time decreases and pulse energy rises with the increase in the pressure and discharge voltage. The minimum duration time exceeds 13 ns, the pulse energy is 450 mJ, and the beam divergence angle is 3 mrad.
Keywords:XeCl~* excimer laser  UV preionization  Nanosecond discharge  Pulsed laser deposition technique  Glow discharge
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《光谱学与光谱分析》浏览原始摘要信息
点击此处可从《光谱学与光谱分析》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号