An XPS study on the surface reduction of V2O5(0 0 1) induced by Ar ion bombardment |
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| Authors: | Geert Silversmit Diederik Depla Guy B Marin |
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| Institution: | a Ghent University, Department of Solid State Sciences, Krijgslaan 281 S1, B-9000 Gent, Belgium
b Ghent University, Laboratorium voor Petrochemische Techniek, Krijgslaan 281 S5, B-9000 Gent, Belgium |
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| Abstract: | The effect of the irradiation with Al Kα X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(0 0 1) crystal was examined. Afterwards, the surface reduction of the V2O5(0 0 1) surface under Ar+ bombardment was studied. The degree of reduction of the vanadium oxide was determined by means of a combined analysis of the O1s and V2p photoelectron lines. Asymmetric line shapes were needed to fit the V3+2p photolines, due to the metallic character of V2O3 at ambient temperature. Under Ar+ bombardment, the V2O5(0 0 1) crystal surface reduces rather fast towards the V2O3 stoichiometry, after which a much slower reduction of the vanadium oxide occurs. |
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| Keywords: | Vanadium oxide V2O5(0 0 1) X-ray photoelectron spectroscopy (XPS) V2p photoelectron core level XPS analysis Vanadium oxidation state |
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