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Arresting photodegradation of porous silicon by a polymer coating
Authors:NP Mandal  SC Agarwal
Institution:a Department of Physics, Indian Institute of Technology, Kanpur 208016, India
b Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208016, India
Abstract:Light soaking in air rapidly decreases photoluminescence (PL) of porous silicon (PS) and increases electron spin resonance (ESR) signal. In vacuum, a short light exposure (<2700 s) increases PL and decreases ESR, but longer exposures again degrade the PL. We could arrest the light-induced degradation over long periods by applying a thin polymer coating, which resulted in constant PL and ESR intensities. The PL intensity of coated PS is comparable to the PL intensity of a fresh PS sample in air. FTIR spectrum suggests new bond formations at the PS/polymer interface that may be responsible for PL stability.
Keywords:61  46  +w  61  82  Rx  78  55  &minus  m
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