Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene) |
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| Authors: | Christopher M Bates Marco A Bedolla Pantoja Jeffrey R Strahan Leon M Dean Brennen K Mueller Christopher J Ellison Paul F Nealey C Grant Willson |
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| Institution: | 1. Department of Chemistry, The University of Texas at Austin, Austin, Texas 78712;2. Department of Chemical and Biological Engineering, The University of Wisconsin–Madison, Madison, Wisconsin 53706;3. Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712 |
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| Abstract: | The successful synthesis, characterization, and directed self‐assembly of a silicon‐containing block copolymer, poly(styrene‐block‐trimethylsilylisoprene) (P(S‐b‐TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene‐block‐methyl methacrylate) is reported. A Sakurai, Grignard‐type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S‐b‐TMSI) was successfully ordered and oriented by directed self‐assembly. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013 |
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| Keywords: | anionic polymerization diblock copolymers directed self‐assembly lithography trimethylsilylisoprene |
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