Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side‐chains: Effect of spacer‐chain length |
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| Authors: | Takeo Sasaki Takumi Yoneyama Shota Hashimoto Sumie Takemura Yumiko Naka |
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| Affiliation: | Department of Chemistry, Tokyo University of Science, , Shinjuku‐ku, Tokyo, 162‐8601 Japan |
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| Abstract: | Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generators in the side‐chain was investigated. Irradiation with UV light generated base on the side‐chains and induced depolymerization based on proton abstraction on the main‐chain. The effect of the length of the spacer chain, which connects the photobase‐generating moiety to the polymer main chain on the photoinduced depolymerization, also was investigated. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013 , 51, 3873–3880 |
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| Keywords: | degradation lithography photobase generator photoinduced depolymerization photoresists poly(olefin sulfone)s |
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