| Abstract: | AlxGa1−xAs LPE growth was studied within the temperature range of 930–900°C with Al concentrations in solutions from 0.04 to 2.4 at.%. AlAs concentration in layers has been shown to grow with the cooling rate increase of solution. Interface and volume nucleation parameter dependence of Ki and Kv and formation time tf on Al concentration in Ga solution have been found. Addition of Al to Ga solution increases critical values of As supersaturation (supercooling) and, as a result, increase in thickness of AlxGa1−xAs layers compared with GaAs layers have been determined in spite of As concentration lowering in Ga solution. |
