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螺旋波等离子体中螺旋波与Trivelpiece-Gould波模式耦合及线性能量沉积特性参量分析
引用本文:李文秋,赵斌,王刚,相东.螺旋波等离子体中螺旋波与Trivelpiece-Gould波模式耦合及线性能量沉积特性参量分析[J].物理学报,2020(11):137-145.
作者姓名:李文秋  赵斌  王刚  相东
作者单位:中国科学院空天信息创新研究院;普林斯顿大学;中国科学院大学电子电气与通信工程学院;北京微电子技术研究所
基金项目:国家留学基金委公派留学项目(批准号:201804910897)资助的课题.
摘    要:采用有限温度等离子体介电张量模型,在考虑粒子热效应情形下,通过求解传导边界条件下等离子体柱中本征模的色散关系,分析了螺旋波等离子体中典型参量条件下螺旋波与Trivelpiece-Gould(TG)波的耦合特性及线性能量沉积特性.在w/(2π)=13.56 MHz和TeV,i=0.1TeV,e参量条件下计算结果表明:对于螺旋波,存在截止静磁场B0,H,cutoff与截止等离子体密度n0,H,cutoff,在B0>B0,H,cutoff或n0
关 键 词:螺旋波等离子体  模式耦合  功率沉积  色散关系

Parametric analysis of mode coupling and liner energy deposition properties of helicon and Trivelpiece-Gould waves in helicon plasma
Li Wen-Qiu,Zhao Bin,Wang Gang,Xiang Dong.Parametric analysis of mode coupling and liner energy deposition properties of helicon and Trivelpiece-Gould waves in helicon plasma[J].Acta Physica Sinica,2020(11):137-145.
Authors:Li Wen-Qiu  Zhao Bin  Wang Gang  Xiang Dong
Institution:(Aerospace Information Research Institute,Chinese Academy of Sciences,Beijing 100094,China;Princeton Plasma Physics Laboratory,Princeton University,New Jersey 08543,USA;School of Electronic,Electrical and Communication Engineering,University of Chinese Academy of Sciences,Beijing 100049,China;Beijing Institute of Aerospace Micro-electromechanical Technology,Beijing 100094,China)
Abstract:Based on the finite temperature plasma dielectric tensor model which contains the particle thermal effect,by numerically solving the eigenmode dispersion relation of electromagnetic waves propagating in radially uniform and magnetized warm plasma column which is surrounded by conducting boundary,the mode coupling characteristic and liner damping mechanism induced wave power deposition properties of helicon and Trivelpiece-Gould(TG)waves are parametrically analyzed.The detailed investigations show as follows.Under typical helicon plasma parameter conditions,i.e.wave frequency w/(2π)=13.56 MHz,ion temperature is much smaller than electron temperature,for the helicon wave,there exist a cut-off magnetic field B0,H,cutoff and a cutoff plasma density n0,H,cutoff,for which under the conditions of B0>B0,H,cutoff or n0
Keywords:helicon plasma  mode coupling  power deposition  dispersion relation
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