| 直流电弧等离子喷射CVD中控制生长(111)晶面占优的金刚石膜 |
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| 引用本文： | 周祖源,陈广超,戴风伟,兰昊,宋建华,李彬,佟玉梅,李成明,黑立富,唐伟忠.直流电弧等离子喷射CVD中控制生长(111)晶面占优的金刚石膜[J].人工晶体学报,2006,35(3):478-480. |
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| 作者姓名： | 周祖源 陈广超 戴风伟 兰昊 宋建华 李彬 佟玉梅 李成明 黑立富 唐伟忠 |
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| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083;北京科技大学材料科学与工程学院,北京,100083;北京科技大学冶金与生态学院,北京,100083 |
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| 基金项目： | 国家863计划(No.2002AA305508)，国家自然基金(No.50472095)，教育部留学回国基金(No.2003-14)，北京市科技新星(No.2003A13)资助 |
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| 摘 要： | 运用光发射谱(OES)技术对大功率直流电弧等离子喷射CVD金刚石膜的气相沉积环境进行了原位诊断,研究了气相环境中主要含碳基团的浓度及分布与沉积参数的关系,发现了C2基元比其他基元对沉积参数更加敏感.利用光发射谱对C2基元发射强度的监测,实时调控沉积各参数,在大功率直流电弧等离子喷射CVD中实现了(111)晶面占优的金刚石膜的可控生长,I(111)/I(220)XRD衍射峰强度的比值达48.
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| 关 键 词： | 光发射谱 金刚石膜 直流电弧等离子喷射CVD (111)占优晶面 |
| 文章编号： | 1000-985X（2006）03-0478-03 |
| 收稿时间： | 02 20 2005 12:00AM |
| 修稿时间： | 2005-02-20 |
Controlling Fabrication of (111)Crystal Surface Dominating Diamond Film by DC ARC Plasma Jet CVD |
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| ZHOU Zu-yuan,CHEN Guang-chao,DAI Feng-wei,LAN Hao,SONG Jian-hua,LI Bin,TONG Yu-mei,LI Cheng-ming,HEI Li-fu,TANG Wei-zhong.Controlling Fabrication of (111)Crystal Surface Dominating Diamond Film by DC ARC Plasma Jet CVD[J].Journal of Synthetic Crystals,2006,35(3):478-480. |
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| Authors: | ZHOU Zu-yuan CHEN Guang-chao DAI Feng-wei LAN Hao SONG Jian-hua LI Bin TONG Yu-mei LI Cheng-ming HEI Li-fu TANG Wei-zhong |
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| Institution: | 1. School of Material Science and Engineering, University of Science and Technology of Beijing, Beijing 100083 ,China; 2. School of Metallurgical and Ecological Engineering, University of Science and Technology of Beijing, Beijing 100083 ,China |
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| Abstract: | Gas atmosphere was characterized in-situ by optical emission spectra(OES) technique in the high power DC arc plasma jet CVD diamond film system.Density and distribution of the carbon-containing radicals were studied in this kind of depositing environment.The experiments showed that C_2 was more sensitive to the deposition parameters than other radicals.Controlling fabrication of(111)crystal surface dominating diamond films was performed by detecting C_2 with OES technique in high power DC arc plasma jet CVD.XRD intensity ratio of(111) and(220) in the best film arrived at 48. |
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| Keywords: | OES diamond film DC arc plasma jet CVD (111) dominating crystal surface |
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