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Copper diffusion in copper sulfide: a systematic study
Authors:S. Cassaignon  Th. Pauporté  J. -F. Guillemoles  J. Vedel
Affiliation:(1) Laboratoire d'Electrochimie et de Chimie Analytique (UMR 7575), ENSCP, 11, rue Pierre et Marie Curie, F-75231 Paris Cedex 05, France;(2) Present address: Laboratoire des Liquides Ioniques et Interfaces Chargées. Colloides magnétiques (UMR 7612), Université Pierre et Marie Curie. 4, place Jussieu, case 63, 75252 Paris Cedex 05, France
Abstract:
Copper sulfide Cu2−xS is a model mineral for chalcogenides because of the existence of a non-stoichiometric compounds series in the range Cu2S - CuS in which properties change with x. For this reason, we have studied the influence of the mineral composition on the diffusion in this solid. Electrochemical Impedance Spectroscopy (EIS) applied to Cu2-xS/cupric sulfate electrolyte was the main investigation technique. It enabled us to work at the equilibrium potential at which the composition is fixed and known. Changing the composition by electrochemically removing (or adding) a known amount of Cu, we were able to determine the chemical diffusion coefficient of copper in the composition range (from x=0 to 0.066). In this work, we present the results obtained in the chalcocite and djurleite phases. These results were compared to other values reported in the literature. From this systematic study we discuss various diffusion mechanisms. Our observations support that in chalcocite and djurleite Cu diffuses via a vacancy mechanism. Paper presented at the 5th Euroconference on Solid State Ionics, Benalmádena, Spain, Sept. 13–20, 1998.
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