| 308nm准分子激光对C60薄膜的刻蚀特性研究 |
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| 引用本文： | 宁东,楼祺洪.308nm准分子激光对C60薄膜的刻蚀特性研究[J].光学学报,1995,15(7):09-912. |
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| 作者姓名： | 宁东 楼祺洪 |
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| 作者单位： | 中国科学院上海光学精密机械研究所一室 |
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| 摘 要： | 测量在空气和真空中３０８ｎｍ准分子激光对Ｃ６０薄膜的刻蚀速率和刻蚀阈值，讨论了环境中氧气对刻蚀特性的影响。
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| 关 键 词： | 准分子激光 薄膜 激光刻蚀 碳60 |
| 收稿时间： | 1994/6/9 |
Ablation Characteristics of C_(60) Face by 308 nm Excimer Laser |
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| Ning Dong,Lou Qihong,Ye Zhenhuan,Gao Hongyi,Dong Jingxing,Wei Yunrong,Xiang Shiqing.Ablation Characteristics of C_(60) Face by 308 nm Excimer Laser[J].Acta Optica Sinica,1995,15(7):09-912. |
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| Authors: | Ning Dong Lou Qihong Ye Zhenhuan Gao Hongyi Dong Jingxing Wei Yunrong Xiang Shiqing |
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| Abstract: | The ablation rate and etch threshold of the C60 film are measured by using 308urn excimer laser.The effect of O2gas on the ablation characteristics are discussed. |
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| Keywords: | excimer laser C_(60) film laser ablation |
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