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Preferential sputtering of LiF surfaces monitored by photoelectron spectroscopy and direct recoil spectrometry
Affiliation:1. ICMA (CSIC-Universidad de Zaragoza), C/Maria de Luna 3, 50018 Zaragoza, Spain;2. i3N, Physics Department, University of Aveiro, Aveiro, 3810-193, Portugal;3. CICECO—Aveiro Institute of Materials, Department of Materials and Ceramic Engineering, University of Aveiro, 3810-193 Aveiro, Portugal;4. CICECO—Aveiro Institute of Materials, Physics Department, University of Aveiro, 3810-193 Aveiro, Portugal;1. College of Materials Science and Engineering, Zhejiang University of Technology, Hangzhou, 310014, China;2. Zhejiang Tianneng Energy Technology Co., Ltd, Huzhou, 313100, China;1. Department of Engineering, Università degli Studi di Perugia, Via Duranti 67, 06125, Perugia, Italy;2. Institute of Heat Engineering, Warsaw University of Technology, Warsaw, Poland;3. Department of Engineering for Energy, Systems, Territory and Construction, University of Pisa, Largo Lucio Lazzarino, 56122, Pisa, Italy;1. Institute of Modern Physics, Fudan University, Shanghai 201800, China;2. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Jiading Campus, Shanghai 201800, China;1. Department of Mechanical, Energy and Management Engineering, University of Calabria, Arcavacata di Rende, 87036 Cosenza, Italy;2. Institute of Heat Engineering, Warsaw University of Technology, 21/25 Nowowiejska Street, 00-665 Warsaw, Poland;1. College of Resources and Environmental Science, South-Central University for Nationalities, Wuhan, PR China;2. College of Pharmacy, South-Central University for Nationalities, Wuhan, PR China;3. Otorhinolaryngology, Head and Neck Surgery, Zhongnan Hospital of Wuhan University, Wuhan, PR China;4. Key Laboratory of Plant Germplasm Enhancement and Specialty Agriculture, Wuhan Botanical Garden, The Chinese Academy of Science, Wuhan, PR China
Abstract:
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