Ion-beam reduction of the surface of higher niobium oxide

X-ray photoelectron spectroscopy is used to study the process of reduction of the surface of the higher oxide Nb₂O₅ upon bombardment with inert gas ions (Ar⁺) and reactive gas ions (O₂⁺) with an energy of 1 and 3 keV in high vacuum at room temperature. It is found that, upon bombardment with Ar⁺ ions, the lower oxide NbO and the intermediate oxide NbO₂ are formed in the surface layers of the oxide Nb₂O₅. Bombardment with O₂⁺ ions leads to the formation of an extremely insignificant amount of the intermediate oxide NbO₂ in the surface layers of the oxide Nb₂O₅. It is revealed that the process of ion-beam reduction of the surface of the oxide Nb₂O₅ depends on the ion type, dose, and energy of exposure.