Aluminum thin film enhanced IR nanosecond laser-induced frontside etching of transparent materials |
| |
| Affiliation: | 1. Microoptics and GRIN Optics Group, Applied Physics Department, Faculty of Physics, University of Santiago de Compostela, Santiago de Compostela E15782, Spain;2. NCLA/Inspire Labs, School of Physics, National University of Ireland, University Road, Galway, Ireland;1. Nano-Convergence Machanical Systems Research Division, Korea Institute of Machinery and Materials (KIMM), 156 Gajeongbuk-Ro, Yuseong-gu, Daejeon 305-343, South Korea;2. Department of Nano-Mechatronics, Korea University of Science and Technology (UST), 217 Gajeong-Ro, Yuseong-gu, Daejeon 305-350, South Korea;1. School of Materials Science & Engineering, Nanjing University of Science and Technology, Nanjing, 210094, China;2. School of Mechanical Engineering, Nanjing University of Science and Technology, Nanjing, 210094, China;3. Automotive Engineering Research Institute, Jiangsu University, Zhenjiang, 212013, China;1. Department of Chemistry, Philipps-University Marburg, Hans-Meerwein-Straße 4, 35032 Marburg, Germany;2. Ningbo Institute of Industrial Technology (CNITECH), Chinese Acadamy of Sciences (CAS), No.1219 Zhongguan West Road, Zhenhai District, Ningbo, 315201 Zhejiang, PR China;3. Materials Science Center, 35032 Marburg, Germany |
| |
| Abstract: | Laser processing of glass is of significant commercial interest for microfabrication of precision optical engineering devices. In this work, a laser ablation enhancement mechanism for microstructuring of glass materials is presented. The method consists of depositing a thin film of aluminum on the front surface of the glass material to be etched. The laser beam modifies the glass material by being incident on this front-side. The influence of ablation fluence in the nanosecond regime, in combination with the deposition of the aluminum layer of various thicknesses, is investigated by determining the ablation threshold for different glass materials including soda-lime, borosilicate, fused silica and sapphire. Experiments are performed using single laser pulse per shot in an air environment. The best enhancement in terms of threshold fluence reduction is obtained for a 16 nm thick aluminum layer where a reduction of two orders of magnitude in the ablation threshold fluence is observed for all the glass samples investigated in this work. |
| |
| Keywords: | Laser-induced front side etching LIFE Laser ablation Glass materials Ablation threshold Micro-machining Thin film |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
