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Magnetoresistivity of bismuth films in magnetic fields to 19 Tesla
Authors:C. M. Lerner  Y. P. Ma  J. S. Brooks  R. Messervey  P. Tedrow
Affiliation:(1) Boston University, 02215 Boston, MA, USA;(2) Francis Bitter National Magnet Laboratory, MIT, Cambridge, MA, USA
Abstract:
The longitudinal and transverse magnetoresistance to fields of 19 Tesla and 4.2 K has been measured for bismuth films ranging in thickness from 0.01 to 2 mgrm. We have observed a pronounced maximum in the longitudinal magnetoresistance which is thickness dependent. We compare these results with classical size effect theories for the longitudinal magnetoresistance in terms of magnetic-field-dependent electron scattering at grain and film boundaries. Measurements of the longitudinal magnetoresistance to 38 Tesla show a quenching of the classical size effect in the high field limit. This result strongly supports our analysis.Work supported by NSF grant #DMR 8113456Supported by the National Science Foundation
Keywords:75.30.Gw
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