Si Underlayer Induced Nano-Ablation in AgInSbTe Thin Films

AgInSbTe/Si thin films on glass substrates are prepared by dc magnetron sputtering at room temperature. Using Si underlayer as the thermal diffusion layer, the super-resolution nano-ablation holes with a size of 70hm in the AglnSbTe phase change films are obtained by a far-field focused laser experimental setup, with laser wavelength 405 nm and objective-lens numerical aperture 0.90. The nano-ablation formation mechanism is analysed and discussed via the thermal diffusion of sample structures.