Preparation of the visible light responsive TiO2 thin film photocatalysts by the RF magnetron sputtering deposition method

TiO₂ thin film photocatalysts which could induce photoreactions under visible light irradiation were successfully developed in a single process by applying an ion engineering technique, i.e., the radio frequency (RF) magnetron sputtering deposition method. The TiO₂ thin films prepared at temperatures greater than 773 K showed the efficient absorption of visible light; on the other hand, the TiO₂ thin films prepared at around 573 K were highly transparent. This clearly means that the optical properties of TiO₂ thin films, which absorb not only UV but also visible light, can be controlled by the preparation temperatures of the RF magnetron sputtering deposition method. These visible light responsive TiO₂ thin films were found to exhibit effective photocatalytic reactivity under visible light irradiation (λ > 450 nm) at 275 K for the reductive decomposition of NO into N₂ and N₂O. From various characterizations, the orderly aligned columnar TiO₂ crystals could be observed only for the visible light responsive TiO₂ thin films. This unique structural factor is expected to modify the electronic properties of a TiO₂ semiconductor, enabling the efficient absorption of visible light.