Preparation of Y2O3:Eu thin films by excimer-laser-assisted metal organic deposition |
| |
Authors: | Tetsuo Tsuchiya Akio Watanabe Tomohiko Nakajima Toshiya Kumagai |
| |
Institution: | (1) Thin film Lab, Post Graduate and Research Department of Physics, Mar Ivanios College, Thiruvananthapuram, 695015, India; |
| |
Abstract: | Europium-doped yttrium oxide (Y2O3:Eu) thin films were successfully deposited on quartz and ITO/glass substrates by excimer-laser-assisted metal organic deposition
(ELAMOD) at low temperatures. The effects of laser wavelength and thermal temperature on the films’ crystallinity and photoluminescence
properties were investigated. Films irradiated by an ArF laser at 80 mJ/cm2 and 400–500°C were highly crystallized compared with those prepared by thermal MOD. In contrast, when the film was irradiated
by a KrF laser at 500°C, no crystalline Y2O3:Eu was formed. The Y2O3:Eu film irradiated by the ArF laser at 80 mJ/cm2 and 500°C showed typical PL spectra of Eu3+ ions with cubic symmetry and a 5D0→7F2 transition at ∼612 nm. The PL intensity at 612 nm was much higher for the film prepared with ELAMOD than for that prepared
by the thermal-assisted process, and the photoemission intensity of the film prepared with ELAMOD strongly depended on the
substrate material. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|