大气等离子体加工过程的原子发射光谱研究

大气等离子体加工反应过程中，等离子体发生装置的热稳定过程对去除率有直接影响，CF₄是化学反应中活性F*原子的提供者，O₂是重要的辅助气体。为了寻找这三者对大气等离子体加工反应过程的影响规律，采用大气等离子体加工系统进行加工、光谱仪监控等离子体反应过程的活性F*原子的光谱变化。实验结果表明，在大气压等离子体加工系统中: 热稳定后，活性F*原子强度基本不随时间变化;随着CF₄含量的增加，F*原子谱线轮廓发生了自吸收现象，这说明采用光谱法研究CF₄含量对活性F*原子含量的影响是不完全准确的;由于O₂易和CF₄解离的中间产物反应，抑制活性粒子重新组合，因此一定范围内随着O₂含量增加，活性F*原子增加。

Research on the Atomic Emission Spectroscopy of Atmospheric Pressure Plasma Process

In the reaction of the atmospheric pressure plasma process, the heat stable process of the atmospheric pressure plasma jet has a direct impact on the removal rate, CF₄ is the provider of active F* atom, O₂ is important auxiliary gas, and they play an important role in the process. In order to research the rule of the concentration of the 3 parameters upon the atmospheric pressure plasma processing, the atmospheric pressure plasma jet was used for processing and the spectrometer was used to monitor the changes in the process. The experiment indicates that: when the heat is stable, the concentration of the active F* atom essentially remains unchanged; with increasing the concentration of gas CF₄, the spectrum of the active F* atom has self-absorption phenomena, so using the atomic emission spectroscopy method to monitor the changes in the concentration of active F* atom generated by CF₄ is not completely exact; because O₂ can easily react with the dissociation product of CF₄, which inhibits the compound of the active F* atom, so in a certain range with increasing the concentration of gas O₂, the concentration of the active F* atom becomes strong.