Preparation of Titanium Oxide Layer on Silica Glass Substrate with Titanium Naphthenate Precursor

Nanocrystalline TiO₂ thin films on silica glass substrates were prepared by using a naphthenic acid precursor. As-deposited thin films were heat treated at 500, 600, 700 and 800^∘C for 30 min in air. The TiO₂ thin films were analyzed by High Resolution X-ray diffraction, ultra violet—visible—near infrared spectrophotometer, field emission—scanning electron microscope and scanning probe microscope. After annealing at 600 and 700^∘C, the XRD patterns consist of only anatase peaks of TiO₂ film. Rutile(110) peak begins to appear at an annealing temperature of 800^∘C. Relative high transmittance at visible range was obtained for all films except the film annealed at 800^∘C. Optical band gap, E_g, is in the range between 3.53 and 3.78 eV except the TiO₂ film annealed at 500^∘C. The best hydrophilicity was achieved with a high-temperature annealing.