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Submicron External Electro-optic Measuring System Based on an Electro-optic Solid Immersion Lens

Authors:	Zhanguo Chen Gang Jia Yunlong Liu Zhifa Wu Chao Zhao and Maobin Yi

Institution:	(1) Department of Electronic Engineering, State Key Laboratory on Integrated Optoelectronics, Jilin University, Changchun, 130023, People's Republic of China

Abstract:	In this paper, all electro-optic solid immersion lens (EOSIL) is introduced, which is made of GaAs. A reflecting external electro-optic measuring system based on the EOSIL is built. With a hemispherical GaAs EOSIL used as the external probe, 0.7 µm spot size is obtained when the wavelength of the probing beam from a laser diode is 1.3 µm and a microscope objective with 0.3 numerical aperture is used. The principle of the measuring system is analyzed by Jones matrix. By using the system, the electrical signals propagating on a microstrip transmission line are successfully measured. The voltage sensitivity about 5 mV/ $\sqrt {Hz}$ is measured when 10 kHz sinusoidal electric signal is applied on the microstrip line.

Keywords:	solid immersion lens electro-optic measurement spatial resolution sub-micron
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