Hydrogenolyse des disilanes issus de la synthese industrielle des methylchlorosilanes. Obtention de MeSiHCl2 et Me2SiHCl |
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| Authors: | Raymond Calas Gerard Deleris Jacques Dunogues Marcel Lefort Christian Simmonet |
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| Institution: | Laboratoire de Chimie Organique et Laboratoire de Chimie des Composés Organiques du Silicium et de l''Etain associé au C.N.R.S. (no. 35). Université de Bordeaux I, 351, Cours de la Libération, 33405 Talence Cédex France;Société Rhône-Poulenc, Centre de Recherches des Carrières, 69190 Saint Fonts France |
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| Abstract: | The chlorodisilane residue from the industrial synthesis of methylchlorosilanes is cleaved under hydrogen (25 bars) in the presence of HMPT/nickelocene mixture or nickel (resulting from the reduction of dry NiCl2 by Et3SiH) and leads to the formation of methyldichlorosilane (noble product), to the detriment of the methyltrichlorosilane (much less noble). This reaction also gives an appreciable amount of the rare and very useful dimethylchlorosilane. |
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