Photoinduced microchannels and element change inside silicon by femtosecond laser pulses |
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| Authors: | Yuncan Ma Haitao Shi Jinhai Si Tao Chen Fei Yan Feng Chen Xun Hou |
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| Institution: | 1. Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstraße 2, 79110 Freiburg, Germany;2. Freiburg Materials Research Center (FMF), University of Freiburg, Stefan-Meier-Straße 21, 79104 Freiburg, Germany;1. School of Mechanical Engineering, Southeast University, Nanjing 211189, Jiangsu Province, PR China;2. Jiangsu Key Laboratory of Precision and Micro-Manufacturing Technology, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, Jiangsu Province, PR China;3. Shaanxi Key Laboratory of Non-Traditional Machining, Xi’an Technological University, Xi’an 710021, Shaanxi Province, PR China;4. Department of Mechanical Engineering, Nanjing Agricultural University, Nanjing 210031, Jiangsu Province, PR China;1. School of Mechanical Engineering, Southeast University, Nanjing 211189, Jiangsu Province, PR China;2. School of Mechanical and Electric Engineering, Soochow University, Suzhou 215021, Jiangsu Province, PR China;1. School of Science and Engineering, Teesside University, Middlesbrough TS1 3BA, UK;2. General Engineering Research Institute, Liverpool John Moores University, Byrom Street, Liverpool L3 3AF, UK |
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| Abstract: | Microchannels are fabricated inside silicon along the direction of laser beam by a femtosecond laser at 800 nm, which is located at the absorption region of silicon. Formation mechanism of the microchannels is attributed to spherical aberration. The element change in surrounding of the microchannel is characterized, and results show that oxygen is incorporated into silicon after irradiation. The origin of the oxygen incorporation and the laser intensity dependence of the amount of oxygen are discussed, respectively. |
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