半导体光催化研究进展与展望

评述了目前半导体光催化在国内外的研究概况,并对存在的问题和未来的发展动向进行简要分析.列举了近30年来关于光催化研究的部分成果,内容涉及光催化剂的制备(包括新催化剂的开发, TiO2、 ZnO、 CdS等光催化剂的各种改性或修饰)、光催化作用机理研究、光催化技术的工程化、光催化技术的各种应用研究和产品开发等等从基础到应用研究的各个方面.总体上来看,半导体光催化基本上是一个没有选择性的化学过程,所以再进行大量的不同反应物的光催化活性的评价研究意义已不是很显著,认为未来的半导体光催化研究应该集中在机理的深刻认识、光响应范围宽和量子效率高的催化剂制备、半导体光催化技术工程化及新型光催化产品开发方面.

Prospect and Progress in the Semiconductor Photocatalysis

The recent progress in the researches on semiconductor photocatalysis was surveyed, and some existed problems in the currentstudy and the future trend of developmentwere briefly analyzed. The main achievements in the studies of photocatalysis during the recent three decadeswere particularized, including the preparation of photocatalyst (exploita-tion of novel catalyst, and the modifications to TiO2, ZnO and CdS etc.), mechanism of photocatalytic process, engineering design of photocatalytic reaction, research and development of the products based on photocatalytic principle. Photocatalytic, in the mass, is a nonselective chemical process, so it is no longer importantto redoing a great deal of examination of photocatalytic activity for different reactants. In fact, some repeated reports on the semiconductor photocatalytic phenomena, and explanations of the mechanismwithuot or lack of experiment support have been frequently found in the publications. It is suggested that attention of the future investigation on the semiconductor photocatalysis should focus on the four aspects as followed, i.e. profound comprehension for photocatalytic mechanism, synthesis or preparation of novel photocatalystwith wide response to light and high photo quantum efficiency, engineering of photocatalytic reaction, and developing of newtype photocatalytic products.