Properties of HfO2 thin films prepared by dual-ion-beam reactive sputtering |
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| Authors: | Dongping Zhang Ping Fan Congjuan Wang Xingmin Cai Guangxing Liang Jianda Shao Zhengxiu Fan |
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| Institution: | 1. Institute of Thin Film Physics and Applications, Shenzhen University, Shenzhen 518060, PR China;2. Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800, PR China;1. National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin, 150080, China;2. Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, Tianjin, 300308, China;1. State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, PR China;2. Department of Physics, China Jiliang University, Hangzhou 310018, PR China;1. School of Science, Nanjing University of Science and Technology, Nanjing 210094, China;2. College of Teacher Education, Nanjing Xiaozhuang University, Nanjing 211171, China;1. Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin, 300308, China;2. National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin, 150080, China |
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| Abstract: | HfO2 thin films were prepared in dual-ion-beam reactive sputtering (DIBRS) method. Spectrophotometer, surface thermal lensing (STL) technique, Rutherford backscattering (RBS), and X-ray diffraction (XRD) were employed in measuring the transmittance, absorptance, stoichiometry, and microstructure, respectively. Experimental results indicate that the peak transmittance value of the sample is about 90%. Weak absorptance measurement for 1064 nm wavelength laser by STL technique investigated that the absorption is 180 ppm for as-grown sample, which is larger than expected. Substoichiometry is the main cause for larger absorptance, which could be proved by RBS and annealing test results. XRD result shows that the films are polycrystalline, and the monoclinic is the dominant phase. |
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