Graphitization of activated carbon under high pressures and high temperatures |
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Authors: | JG Zhao FY Li CQ Jin |
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Institution: | 1. College of Physics and Energy, Fujian Normal University, Fuzhou 350007, China;2. Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou 350002, China;1. Department of Applied Chemistry, School of Science, Xi''an Jiaotong University, Xi''an, 710049, PR China;2. Chengdu Galaxy Power Co., LTD, Chengdu, 610505, PR China;3. School of Science, State Key Laboratory for Mechanical Behavior of Materials, Xi''an Jiaotong University, Xi''an, 710049, PR China;1. School of Chemistry and Environment, South China Normal University, Guangzhou 510006, PR China;2. Dongguan McNair New Power Co. Ltd., Dongguan 523000, PR China;1. Functional Thin Films Research Center, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China;2. Nano Science and Technology Institute, University of Science and Technology of China, Suzhou 215123, China |
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Abstract: | Activated carbon was treated at 5.0 GPa up to 1600 °C and the structural evolution in the graphitization process was investigated. The graphitization temperature is reduced to 1200 °C at 5 GPa, as reflected by x-ray diffraction patterns. Honeycomb-like structures come into being in the high-pressure sintering temperature range of 1000–1100 °C and slice-like structures appear after graphitization. Raman frequency and half width drop drastically near the graphitization temperature, and the appearance of D and D′ lines indicates there are still some disorder structures in the graphitized activated carbon. |
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