Fabrication and characterization of p-ZnO/n-Zn0.8Cd0.2O/n-ZnO heterojunction |
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Authors: | G.D. Yuan Z.Z. Ye J.Y. Huang L.P. Zhu |
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Affiliation: | State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, People’s Republic of China |
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Abstract: | ![]() We report the fabrication of p-ZnO/n- Zn0.8Cd0.2O/n-ZnO heterojunctions that contain Al–N codoped p-ZnO, undoped n- Zn0.8Cd0.2O, and Al-doped n-ZnO layers. An InZn alloy is used as the p- and n-ZnO Ohmic contact electrodes. This structure exhibits improved rectifying p–n junction behavior, with forward turn-on voltage in the range of 3–5 V. The reverse breakdown voltage can be as high as 15 V, with 10?6-A reverse leakage current. Photoluminescence spectra show strong near band-edge emissions for both p- and n-ZnO at 368 nm and for undoped n- Zn0.8Cd0.2O, which is substantially red-shifted to 399 nm. |
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