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An ESR study of radiation damage of bisphenol-A-based epoxy resin at low temperature: Selective hydrogen addition to benzene-ring-forming cyclohexadienyl-type radical
Authors:Bunzo Eda  Machio Iwasaki
Abstract:In the γ-irradiated aromatic epoxy resin, diglycidylether of bisphenol A cured with diaminodiphenylmethane, the cyclohexadienyl-type radical is produced as one of the main radical species. Although both the resin and the hardener contain benzene rings, it is concluded that the cyclohexadienyl-type radical is formed by selective addition of the OH hydrogen to the benzene ring on the resin side. The selectivity is accounted for in terms of electron capture by the benzene ring followed by proton transfer from the OH group which is located in front of the benzene ring. This reaction scheme is further supported by the effect of the addition of an electron scavenger on the radical yield as well as by the photobleaching behavior of the radicals involved.
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