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Polymeric waveguides based on photopolymerizing methacrylate compositions |
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| Authors: | S. P. Molodnyakov V. V. Treushnikov V. M. Treushnikov O. N. Gorshkov A. P. Kasatkin M. E. Shenina A. N. Shushunov A. V. Kruglov V. V. Semenov |
| Affiliation: | 1. Reper-NN Enterprise, ul. Barrikad 1, Nizhni Novgorod, 603003, Russia 2. Physical-Technical Research Institute, Lobachevsky Nizhni Novgorod State University, pr. Gagarina 23, Nizhni Novgorod, 603950, Russia 3. Razuvaev Institute of Organometallic Chemistry, Russian Academy of Sciences, ul. Tropinina 49, Nizhni Novgorod, 603600, Russia |
| Abstract: | Contact photolithography was used to fabricate three-layer polymeric waveguide structures with transverse dimensions of 50 × 90 μm on the basis of two photopolymerizing methacrylate compositions with different refractive indices. The optical loss on the wavelength of 632.8 nm was 0.37 ± 0.14 dB cm?1. This loss is mostly due to the light scattering by the material of the waveguide layer produced by bulk polymerization. |
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