Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source |
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Authors: | S K Angra Parshant Kumar R R Dongaonkar R P Bajpai |
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Institution: | (1) Microelectronics Group, Central Scientific Instruments Organisation, Sector-30, 160 020 Chandigarh, India |
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Abstract: | Electron cyclotron plasma reactor are prone to instabilities in specific input power 3–7] region (150–450 watts). In this
region power absorption by gas molecules in the cavity is very poor and enhanced input power gets reflected substantially
without increasing ion density. There are abrupt changes in plasma characteristics when input power was decreased from maximum
to minimum, it was observed that reflected power changed from <2% to ∼50%. Minimum two jumps in reflected power were noticed
in this specific power region and these appear to be highly sensitive to three stub tuner position in the waveguide for this
particular input power zone. Unstable plasma region of this source is found to be dependent upon the magnetic field strength.
Some changes in reflected power are also noticed with pressure, flow and bias and they are random in nature. |
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Keywords: | Electron cyclotron resonance plasma instability magnetic field |
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