Mass spectrometer-wall probe diagnostic of Ar discharges containing SF6 and/or O2: Reactive ions in etching plasmas |
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| Authors: | H. G. Lergon M. Venugopalan K. G. Müller |
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| Affiliation: | (1) Fachbereich Physik, Universität Essen, D-4300 Essen, FRG;(2) Chemistry Department, Western Illinois University, 61455 Macomb, Illinois |
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| Abstract: | Positive and negative ions of Ar/SF6 and Ar/SF6/O2 plasmas (etching plasmas) and of Ar/O2 plasmas (cleaning plasmas) in Pyrex tubes have been investigated using a mass spectrometer-wall probe diagnostic technique. The measurement of negative ions proved to be a very sensitive method for the detection of wall material. In etching plasmas with small admixtures of SF6, oxygen was found as the only representative of wall material. At larger amounts of SF6, silicon could be detected. In cleaning plasmas with small admixtures of O2 applied to a previously etched Pyrex surface, fluorine was found, indicating the reversal of fluoridation by oxygenation. |
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| Keywords: | Negative ions positive ions etching plasmas SF6 O2 |
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