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Thermoelectric properties of photo- and thermal CVD boron and boron phosphide films
Authors:Y. Kumashiro  T. Enomoto  K. Sato  Y. Abe  K. Hirata  T. Yokoyama
Affiliation:Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
Abstract:
The electrical properties of n-BP films newly prepared by thermal CVD in the B2H6-PH3-H2 system were improved by a deuterium lamp excitation. High-temperature electrical conductivity and thermoelectric power of amorphous boron and polycrystalline boron phosphide films grown on silica glass were measured to evaluate the thermoelectric figure-of-merit (Z). In particular, the Z-value for photo-thermal BP films was higher (10−4/K) than that of boron films, indicating that they are promising for high-temperature thermoelectric materials.
Keywords:Amorphous boron films   Polycrystalline boron phosphide films   van der Pauw method   Electrical conductivity   Thermoelectric power   Thermoelectric figure-of-merit
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