Nitrogen irradiation of Fe/Si bilayers: nitride versus silicide phase formation

In the course of a systematic investigation of heavy ion-irradiated Fe/Si layers, we have studied atomic transport and phase formation induced by 22-keV ¹⁴N²⁺ ion implantation in ⁵⁷Fe(30 nm)/Si bilayers at high fluences. We report here results obtained by Rutherford backscattering spectroscopy, X-ray diffraction, and conversion electron Mössbauer spectroscopy after implantation and post-implantation annealing treatments. The irradiations caused little sputtering, but significant interface mixing. During implantation, iron nitrides, but no silicides were formed, even at the highest nitrogen fluence of 2×10¹⁷ ions/cm². When heating these samples in vacuo up to 700 °C, the iron-rich phases -Fe₃N and -Fe₄N were produced. Starting at 600 °C the silicide phase -FeSi₂ was also identified. PACS 61.72.Ww; 61.80.-x; 68.35.Dv; 81.20.-n; 81.70.-q