Hot carrier effects in double injection phenomena |
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Authors: | M. Dufour S. Cristoloveanu |
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Affiliation: | (1) Laboratoire de Physique des Composants à Semiconducteurs, Institut National Polytechnique de Grenoble, Equipe de recherche associée au CNRS n 659, ENSERG, 23, rue des Martyrs, F-38031 Grenoble Cedex, France |
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Abstract: | ![]() Carrier heating is shown to be responsible for unusualI(V) characteristics observed in small-sizep+nn+ silicon on sapphire (SOS) devices. The classical quadratic law of the semiconductor regime becomes linear for high fields. The influence of dimensions and doping is experimentally checked and a model, based on the regional approximation method, is proposed. The key role is assumed by the hot-carrier region, growing from the cathode, where the electron and hole mobilities are field dependent: µ~E– . A full agreement with the experiment in SOS is found for =0.5. The operating of hot carrierp+nn+ devices can be described concretely with usual formalism by using the concept of effective carrier mobilities, which depend on the applied voltage. |
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Keywords: | 72.20 HJ 73.60 F 85.30 |
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