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Tunneling through narrow-gap semiconductor Sb2Te3 barrier
Authors:E. Hatta  J. Nagao  K. Mukasa
Affiliation:(1) Department of Electronics, Faculty of Engineering, Hokkaido University, 060 Sapporo, Japan;(2) MITI, Hokkaido National Industrial Research Institute, 062 Sapporo, Japan
Abstract:
Tunnel experiments have been performed on Au/Sb2Te3/Al tunnel junctions to study elastic interelectrode tunneling through the small energy gap of a narrow-gap semiconductor. Tunnel conductance exhibited narrow width conductance peak at zero bias voltage. This behaviour is in accordance with the result of the theoretically calculated tunnel conductance, in which the nonparabolic dispersion relation within the energy gap of the narrow-gap semiconductor used as a tunnel barrier in a metal/narrow-gap semiconductor/metal tunnel structure is included. And some interesting structures are also observed in the conductance curves.
Keywords:73.40S
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