Formation and electrochemical desorption of self‐assembled monolayers as studied by ToF‐SIMS |
| |
| Authors: | Michal Tencer Heng‐Yong Nie Pierre Berini |
| |
| Institution: | 1. University of Ottawa, School of Information Technology and Engineering, 161 Louis Pasteur St., Ottawa, Ontario, K1N 6N5, Canada;2. MST Consulting, Ottawa, Ontario, Canada;3. Surface Science Western, University of Western Ontario, London, Ontario, N6A 5B7, Canada;4. Spectalis Corp., Kanata North RPO, Ottawa, Ontario, K2K 2P4, Canada |
| |
| Abstract: | Time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) was used to study a number of processes involving thiol‐based self‐assembled monolayers (SAMs) on nontextured (polycrystalline) gold (Au) films deposited on Si wafers. ToF‐SIMS turned out to be a convenient and versatile semiqualitative technique which readily verified electrochemical desorption of a SAM and formation of another SAM on the same sample via reincubation with another thiol. The technique, allowing one to follow simultaneously more than one species on the surface, showed that any formation of a mixed SAM on surfaces which did not undergo electrolysis was negligible with the applied time scale (minutes). Copyright © 2010 John Wiley & Sons, Ltd. |
| |
| Keywords: | thiols self‐assembled monolayer SIMS time‐of flight gold silver plasmon polariton electrolysis desorption |
|
|
