Synthesis and self‐assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain

Thermotropic POSS‐containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA‐b‐PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS‐containing polymer segments tended to form matrix of microphase‐separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA₁₇₅‐b‐PMAC11POSS₁₁ (?_PMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well‐ordered dot‐ and fingerprint‐type nanostructures. This is the first report in a series of POSS‐containing block polymers that are capable for thermal annealing to generate well‐ordered microphase‐separated nanostructures in thin films. The novel thermotropic POSS‐containing block copolymer offers a promising material for block copolymer lithography. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011