Interfacial Studies for improving the adhesion of Cr/Al films on composites |
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Authors: | Dong‐Cai Zhao Geng‐Jie Xiao Ni Ren Zhan‐Ji Ma Sheng‐Hu Wu |
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Institution: | National Key Laboratory of Science and Technology on Surface Engineering, Lanzhou Institute of Physics, Lanzhou 730000, China |
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Abstract: | The composites, such as CFRP and GFRP, have been widely applied in spaceflight, for their low specific gravity, low cost, and additional structural stability. However, the high resistivity of the composites severely inhibits their further applications. Therefore, Cr/Al films with low resistivity and high adhesion were deposited on composites by cathodic arc technique. The films were characterized by pull test, Dektak 8 Stylus Profilometer, SEM, XPS, XRD and Z‐82 standard four probes. Results show that the aluminum film of fcc structure is compact and uniform, with resistivity as low as bulk Al. The adhesion between Cr buffer layer and composite substrate was greatly enhanced because of the formation of the chemical bonds, such as Cr? C, Cr? O and Cr? N, at the Cr/composite interface. Copyright © 2011 John Wiley & Sons, Ltd. |
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Keywords: | cathodic arc deposition metallization Cr/Al film composites XPS |
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