| 氩气对直流弧光放电PCVD金刚石薄膜晶体特征的影响 |
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| 引用本文： | 张湘辉,汪灵,龙剑平,常嗣和.氩气对直流弧光放电PCVD金刚石薄膜晶体特征的影响[J].人工晶体学报,2010,39(1):130-134. |
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| 作者姓名： | 张湘辉 汪灵 龙剑平 常嗣和 |
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| 作者单位： | 成都理工大学材料与化学化工学院,成都,610059;成都理工大学金刚石薄膜实验室,成都,610059;成都理工大学材料与化学化工学院,成都,610059 |
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| 基金项目： | 国家自然科学基金(No.40572030,50974025);;四川省科技厅重点科技攻关项目(05GG021-001);;四川省教育厅自然科学重点科研项目(2003A142);;成都理工大学研究基金项目(2005GY02);;四川省教育厅自然科学项目(07ZB009) |
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| 摘 要： | 本文采用自主研制的直流弧光放电等离子体CVD设备,在YG6硬质合金基体上进行了不同氩气流量下金刚石薄膜的制备研究.采用SEM对金刚石薄膜的晶体特征进行了观察.结果表明,氩气对直流弧光放电等离子体CVD金刚石薄膜的晶体特征有明显影响.在CH_4/H_2恒定时(0.8;),硬质合金基体上制备的金刚石薄膜表面形貌随Ar流量增加而变化的规律,即从以(111)八面体晶面为主→(111)和(100)立方八面体混杂晶面→以(100)立方体晶面为主→菜花状的顺序转变;当Ar流量为420～700 mL/min时,金刚石晶粒的平均尺寸由1.5 μm 逐步增大到7 μm;Ar流量为700～910 mL/min时,金刚石晶粒的平均尺寸由7 μm急剧减小到纳米尺度,约50 nm.
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| 关 键 词： | 金刚石薄膜 晶体特征 直流弧光放电等离子体CVD |
Effect of Argon Gas on the Crystal Feature of Diamond Films Deposited by Direct Current Arc Discharge PCVD Method |
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| ZHANG Xiang-hui,WANG Ling,LONG Jian-ping,CHANG Si-he.Effect of Argon Gas on the Crystal Feature of Diamond Films Deposited by Direct Current Arc Discharge PCVD Method[J].Journal of Synthetic Crystals,2010,39(1):130-134. |
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| Authors: | ZHANG Xiang-hui WANG Ling LONG Jian-ping CHANG Si-he |
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| Institution: | 1.College of Materials and Chemistry&Chemical Engineering;Chengdu University of Technology;Chengdu 610059;China;2.Key Laboratory of Diamond Film;China |
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| Abstract: | Diamond films have been deposited on an abraded cemented carbide tungsten tool by DC arc discharge plasma CVD under different argon gas flow.The crystal feature of synthesized diamond films was characterized by scanning electron microscopy.The results indicated that the Ar gas has evident effect on the crystal feature of the direct current arc discharge PCVD diamond film.It showed that as argon gas flow increasing,CH4/H2=0.8%,the surface morphology of the diamond films would be changed from (111) crystal fa... |
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| Keywords: | diamond film crystal feature DC arc discharge plasma chemical vapor deposition |
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