IR laser‐induced decomposition of disiloxane for chemical vapour deposition of poly(hydridosiloxane) films期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

IR laser‐induced decomposition of disiloxane for chemical vapour deposition of poly(hydridosiloxane) films

Authors:	Josef Pola,Marké ta Urbanová ,Vladislav Dř í nek,Jan Š ubrt,Helmut Beckers

Abstract:	Continuous‐wave CO₂‐laser‐induced gas‐phase decomposition of H₃SiOSiH₃, dominated by elimination and polymerization of transient silanone H₂SiO and yielding silane and hydrogen as side‐products, represents a convenient process for chemical vapour deposition of poly(hydridosiloxane) films. Copyright © 1999 John Wiley & Sons, Ltd.

Keywords:	disiloxane decomposition polyhydridosiloxane films chemical vapour deposition