Air microwave-induced plasma: Relation between ion density and atomic oxygen density |
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| Authors: | J. Al Andari A. M. Diamy J. C. Legrand R. I. Ben-Aim |
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| Affiliation: | (1) Laboratoire de Chimie Générale, S.D.I. du CNRS, Université Pierre et Marie Curie, B 196, Tour 55, 4 Place Jussieu, 75252 Paris Cedex 05, France |
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| Abstract: | Electron temperature and ion density are measured in an air microwave-induced plasma (2450 MHz) by means of a floating double probe. A 'cinetic scheme for ion formation and decay is set up, and a relationship between atomic oxygen and ion densities is obtained. From this relationship an order-of-magnitude of atomic oxygen concentration in the discharge is derived and compared with results obtained by optical actinometry in another work. |
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| Keywords: | Air microwave plasma ion density oxygen atom density |
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