Dynamic simulation on the preparation process of thin films by pulsed laser |
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Authors: | Duanming Zhang Zhihua Li Boming Yu Mingtao Huang Li Guan Zhicheng Zhong and Guodong Li |
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Institution: | 1. Department of Physics, Huazhong University of Science and Technology, Wuhan 430074, China 2. Department of Physics, Xiangfan University, Xiangfan 441000, China |
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Abstract: | An ablation model of targets irradiated by pulsed laser is established. By using the simple energy balance conditions, the
relationship between ablation surface location and time is derived. By an adiabatic approximation, the continuous-temperature
condition, energy conservation and all boundary conditions can be established. By applying the analytical method and integral-approximation
method, the solid and liquid phase temperature distributions are obtained and found to be a function of time and location.
The interface of solid and liquid phase is also derived. The results are compared with the other published data. In addition,
the dynamics process of pulsed laser deposition of KTN (Kta0.65Nb0.35O3) thin film is simulated in detail by using fluid dynamics theory. By combining the expression of the target ablation ratio
and the dynamic equation and by using the experimental data, the effects of laser action parameters on the thickness distribution
of thin film and on the thin film component characteristics are discussed. The results are in good agreement with the experimental
data. |
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Keywords: | ablation ratio KTN thin film plasma pulsed laser deposition (PLD) |
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