首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Dynamic simulation on the preparation process of thin films by pulsed laser
Authors:Duanming Zhang  Zhihua Li  Boming Yu  Mingtao Huang  Li Guan  Zhicheng Zhong and Guodong Li
Institution:1. Department of Physics, Huazhong University of Science and Technology, Wuhan 430074, China
2. Department of Physics, Xiangfan University, Xiangfan 441000, China
Abstract:An ablation model of targets irradiated by pulsed laser is established. By using the simple energy balance conditions, the relationship between ablation surface location and time is derived. By an adiabatic approximation, the continuous-temperature condition, energy conservation and all boundary conditions can be established. By applying the analytical method and integral-approximation method, the solid and liquid phase temperature distributions are obtained and found to be a function of time and location. The interface of solid and liquid phase is also derived. The results are compared with the other published data. In addition, the dynamics process of pulsed laser deposition of KTN (Kta0.65Nb0.35O3) thin film is simulated in detail by using fluid dynamics theory. By combining the expression of the target ablation ratio and the dynamic equation and by using the experimental data, the effects of laser action parameters on the thickness distribution of thin film and on the thin film component characteristics are discussed. The results are in good agreement with the experimental data.
Keywords:ablation ratio  KTN thin film  plasma  pulsed laser deposition (PLD)
本文献已被 万方数据 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号