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XPS and atomic force microscopy of plasma-treated polysulfone |
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| Authors: | J. Hopkins J. P. S. Badyal |
| Abstract: | Surface treatment of polysulfone by O2, H2, He, Ne, Ar, and CF4 nonisothermal glow discharges has been investigated by x-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The chemical and topographical modification of the surface is found to be strongly influenced by the type of feed gas employed. © 1996 John Wiley & Sons, Inc. |
| Keywords: | plasma XPS AFM polysulfone |