Oxidation behavior of NiAl alloy at low temperatures |
| |
| Authors: | Naofumi Ohtsu Masaoki Oku Kazuo Obara Shun Ito Toetsu Shisido Kazuaki Wagatsuma |
| |
| Affiliation: | 1. Institute for Materials Research, Tohoku University, Sendai 980‐8577, JapanInstitute for Materials Research, Tohoku University, 2‐1‐1 Katahira, Aoba‐ku, Sendai 980‐8577, Japan.;2. Institute for Materials Research, Tohoku University, Sendai 980‐8577, Japan |
| |
| Abstract: | ![]()
Oxidation behavior of NiAl alloy at low temperatures was studied. A NiAl plate was oxidized by exposure to ambient atmosphere at room temperature, heated at 473 K in air, and heated at 773 K in air. The oxide formed on the NiAl surface was investigated by angle‐resolved X‐ray photoelectron spectroscopy (AR‐XPS). Chemical composition and atomic concentration in the oxide layer were analyzed with factor analysis of XPS spectra. Exposure of the NiAl plate to the ambient atmosphere resulted in the formation of an Al2O3 layer along with a small amount of NiO. Oxidation of the NiAl plate at 473 K in air formed a film of double‐layered oxide; the top layer consisted of NiAl2O4 and a small amount of NiO, and the second layer was Al2O3. Successive oxidation at 773 K only changed the oxide‐layer thickness without changing the structure. Formation of oxide observed in the present study corresponds to the thermodynamic prediction for the oxidation behavior of NiAl at 1373 K. Copyright © 2007 John Wiley & Sons, Ltd. |
| |
| Keywords: | NiAl alloy initial‐stage oxidation angle‐resolved XPS factor analysis |
|
|
