One-step fabrication of ultralow dielectric polyimide films consisting of size-controlled mesoporous nanoparticles

Dielectric materials with ultralow dielectric constants (<2.0) are desiderated in the integrated circuits (ICs). In this work, we fabricated polyimide (PI) films consisting of mesoporous nanoparticles (MPNPs-PF) through a one-step solvent evaporation induced self-assembly method. Poly(amic acid) was selected as the polymer matrix; and the commercial triblock copolymer F127 was adopted as the mesoporous template as well as the nanoparticle morphology controller, respectively. After imidization and template removal, the dense films consisting of closed-packed PI nanoparticles with an average diameter less than 50 nm were obtained. Since the nanoparticles were fully composed of worm-like mesopores, the dielectric constant (k value) of the resultant porous PI films can reach as low as 1.92. When the reactive end-capper of maleic anhydride (MA) was blended into poly(amic acid), k value decreased even lower to 1.86. Meanwhile, the modulus of the resultant porous PI films was higher than 1 GPa.