A contribution to the solution of the problem of quantification in surface analysis work using glow discharge atomic emission spectroscopy

The emission intensity from spectral lines has been studied in a Grimm-type glow discharge lamp (GDL). The variation in intensity of Ar I lines was investigated in order to exclude the influence of the sample sputtering rate. The variations in intensity of several analytical lines were then studied and compared with the sample sputtering rate. It was concluded that the sample atom number density in the plasma saturates with increasing voltage. An empirical intensity expression, taking into account the current, voltage and sample composition is presented. This expression was used for the determination of elemental concentrations in Cu based alloys, using a single steel reference sample as standard. An application of this procedure to a surface analysis problem is presented, and the results are compared with atomic absorption measurements. Good agreement was obtained, indicating that surface analysis data can be quantified in a simple and straightforward manner.